ACM Novophane K Shampoo | Severe Dandruff

USD 21.11

ACM Novophane K Shampoo possesses comprehensive anti-dandruff action to combat severe dandruff with itching. Antifungal complex!

Compare

Description

ACM Novophane K Shampoo | Severe Dandruff

Novophane K possesses comprehensive anti-dandruff action to combat severe dandruff with itching.  Its antifungal complex containing pyrithione, zinc, and piroctone olamine limits the proliferation of Malassezia yeast, the main causative agents of dandruff. Thanks to juniper essential oil, Novophane K eliminates dandruff while preventing its recurrence and reduces itching. Scales are eliminated by salicylic acid. The scalp is cleansed and itching disappears.

The hair is gently cleansed, once more becoming beautiful and healthy-looking.

More About

Light foam.  No fragrance

Proven results

90% DECREASES NUMBER OF SCALES

90% DECREASES THE THICKNESS OF SCALES

80% DECREASES REDNESS

How to Use ACM Novophane K Shampoo for Severe Dandruff

  • Use 2 to 3 times per week during episodes of dandruff
  • Use ACM Novophane K Shampoo  once to twice per week as maintenance to prevent relapses.
  • Wet the hair. Massage Novophane K anti-dandruff shampoo gently until it foams. Leave for a few minutes, or as per medical prescription.
  • Rinse. In the event of contact with the eyes, rinse thoroughly with water.

Ingredients:

  • Antifungal complex containing pyrithione, zinc, and piroctone olamine
  • Salicylic acid
  • Gentle washing bases

Aqua (Water)Sodium Laureth SulfateSalicylic AcidDipropylene GlycolAcrylates/C10-30 Alkyl Acrylate CrosspolymerCoco-BetainePiroctone OlamineSodium LactateInulinGlyceryl Undecylenate, Juniperus Oxycedrus Wood Oil, NiacinamidePanthenolDecyl GlucosideGlycyrrhetinic Acid, PCA Glyceryl OleateSorbitan CaprylateSodium LevulinateSodium HydroxideSodium Benzoate, Citric Acid

 

 

Additional information

Weight 0.3 kg

Reviews

There are no reviews yet.

Be the first to review “ACM Novophane K Shampoo | Severe Dandruff”

Your email address will not be published. Required fields are marked *